A STUDY OF PHOTORESPONSE FOR COPPER CORROSION INHIBITION BY BTA AND PTD

J Chin Soc Corr Pro

1998, Vol. 18

Issue (1): 57-61 DOI:

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A STUDY OF PHOTORESPONSE FOR COPPER CORROSION INHIBITION BY BTA AND PTD

WANG Zhi-en ZHOU Guo-ding XU Qun-jie (Electrochemical Research Group; Shanghai Institute of Electric Power; Shanghai 200090)

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Abstract The inhibition behaviour of BTA and PTD in borax solution for copper was studied by using pho-toelectrochemical technique. The potential φv, at which Cu2O on the electrode was completely reduced to Cu, was applied to characterize the interaction of Cu2O layer with the film, for example, Cu(I) BTA, formed from inhibitor on the Cu electrode. The more negative the φv, the more efficient the inhibitor. BTA might function as stabilizing Cu2O film on the surface. The corrosion resistance of copper was dependent on the Cu2O film. The inhibitive action of both BTA and PTD on Cu electrode was compared by photoelectrochemical method. The results were in agreement with those of ac impedance measurements.

Key words: Copper electrode Inhibition Photoresponse BTA PTD

Received: 25 February 1998

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WANG Zhi-en ZHOU Guo-ding XU Qun-jie (Electrochemical Research Group; Shanghai Institute of Electric Power; Shanghai 200090). A STUDY OF PHOTORESPONSE FOR COPPER CORROSION INHIBITION BY BTA AND PTD. J Chin Soc Corr Pro, 1998, 18(1): 57-61.

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https://www.jcscp.org/EN/ OR https://www.jcscp.org/EN/Y1998/V18/I1/57

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