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电沉积Ni-P合金初期沉积行为的研究 |
秦秀娟;邵光杰 |
燕山大学环境与化学工程系 |
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Study on the Initial Electro-Deposition Behavior of Ni-P Alloy |
Xiujuan Qin;Guangjie Shao |
燕山大学环境与化学工程系 |
[1]OsakaT ,YamazakiT .MetallizationofAlNceramicsbyelectrolessNi-Pplating[J].J .Electrochem.Soc.,1986,133(11):2345-2347 [2]MartonJP ,SchlesingerM .ThenucleationgrowthandstructureofthinNi-Pfilms[J].J.Electrochem.Soc.,1968,115(1):16-21 [3]FlisJ ,DuquetteDJ.Nucleationandgrowthofelectrolessnickeldepositsonmolybdenumactivatedwithpalladium[J].Ibid,1984,131(1):51-57 [4]SricharoenchaikitP .Thinmetalfilmformationusingelectrolessplating[J].Ibid,1993,140(7):1917-1921 [5]SeverinJW .AstudyonchangesinsurfacechemistryduringtheinitialstagesofelectrolessNi(P)depositiononalumina[J].Ibid,1993,140(3):682-687 [6]YuWeiping,DuanShuzhen.InitialstructureandformedmechanismofelectrodepositionNi-Pamorphousalloy[J].Chin.J.Mater.Research,1996,10(4):419-422(于维平,段淑贞.电沉积Ni-P非晶合金的初期结构及形成机理[J].材料研究学报,1996,10(4):419-422) [7]HommaT .TransmissionelectronmicroscopystudyofelectrolessNi-PandCufilmsatinitialdepositionstage[J].J.Electrochem.Soc.,199,138(5):1269-1274 [8]BesenhardJO .ASTMstudyofPd-catalystforelectrolessNi-PandCudepositiononnonconductorsbymeansofamodifiedgraphitesub strate[J].Ibid,1989,136(12):3608-3610 [9]OsakaT .STMobservationofelectroless-platedcobaltalloythinfilms[J].JapaneseJ.Appl.Phy.,1989,28(3):L465-467 [10]HommaT ,YamazakiT ,OsakaT .Anin-situstudyonelectroless-de positionprocessbyscanningtunnelingmicroscopy[J].J.Electrochem.Soc.,1992,139(3):732-736 [11]JiangXiaoxia,WangZhuyun.ElectrochemistryofAlloyPhase[M].Shanghai:ShanghaiScience&TechnologyPress,1984:320(姜晓霞,王祖韫.合金相电化学[M].上海:上海科学技术出版社,1984:320) |
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