Electrochemical Properties of Nb Coating on TC4 Substrate in Simulated Body Solution

doi:10.11902/1005.4537.2019.270

Journal of Chinese Society for Corrosion and protection

2021, Vol. 41

Issue (1): 71-79 DOI: 10.11902/1005.4537.2019.270

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Electrochemical Properties of Nb Coating on TC4 Substrate in Simulated Body Solution

SHI Kunyu, WU Weijin, ZHANG Yi, WAN Yi, YU Chuanhao(

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School of Mechanical & Electrical Engineering, Wuhan Institute of Technology, Wuhan 430205, China

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Abstract

To improve the corrosion resistance of Ti-alloy applied to human implants, Nb coating was deposited on the surface of Ti-6Al-4V (TC4) alloy by double cathode plasma sputtering technique. The composition and the cross-sectional morphology of the coating were characterized by XRD, XPS and SEM. The electrochemical properties of the coating and the semiconductor properties of the passivation film for the coating and the substrate were studied in Ringer's simulated body solution at 37 ℃ by electrochemical workstation. The results show that the Nb coating exhibits a preferred orientation on the (200) crystal plane, and the coating thickness is about 18 μm without defects such as holes and cracks. The passive film on the Nb coating is mainly Nb₂O₅. Comparing with the TC4 substrate, the coating has higher open circuit potential (E_OCP), corrosion potential (E_corr) and lower corrosion current density (I_corr). Both of the TC4 alloys with and without Nb coating exhibit a single capacitance loop, however, the coated alloy exhibits higher impedance and lower effective capacitance rather than the substrate. The passivation films of two samples exhibit n-type semiconductor characteristics. By different formation potential (E_f), the flat band potential (E_fb), the donor density (N_d) and diffusion coefficient (D₀) of the passivation film on the coating are always lower than that on the bare TC4 alloy.

Key words: Ti-6Al-4V alloy Nb coating corrosion resistance passive film semiconductor property

Received: 19 December 2019

ZTFLH:

TG174.445

Fund: Graduate Innovative Fund of Wuhan Institute of Technology(CX2019242)

Corresponding Authors: YU Chuanhao E-mail: yuchuanhaowh@126.com

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	Kunyu SHI
	Weijin WU
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Cite this article:

SHI Kunyu, WU Weijin, ZHANG Yi, WAN Yi, YU Chuanhao. Electrochemical Properties of Nb Coating on TC4 Substrate in Simulated Body Solution. Journal of Chinese Society for Corrosion and protection, 2021, 41(1): 71-79.

URL:

https://www.jcscp.org/EN/10.11902/1005.4537.2019.270 OR https://www.jcscp.org/EN/Y2021/V41/I1/71

Fig.1 Typical XRD pattern of as-deposited Nb coating

Fig.2 SEM images of the cross section of the Nb coating (a) and enlarged view of the circle area in Fig.2a(b)

Fig.3 Open circuit potential vs time curves of the Nb coating and Ti-6Al-4V alloy in Ringer's solution at 37 ℃

Fig.4 Potentiodynamic polarization curves of the Nb coat-ing and Ti-6Al-4V alloy in Ringer's solution at 37 ℃

Table 1 Electrochemical parameters collected from the polarization curves of the Nb coating and Ti-6Al-4V substrate in Ringer's solution at 37 ℃

Fig.5 Nyquist (a) and Bode (b) plots of the Nb coating and Ti-6Al-4V substrate in Ringer's solution at 37 ℃

Fig.6 Equivalent circuit diagram of EIS

Table 2 Fitting parameters of EIS of the Nb coating and Ti-6Al-4V substrate in Ringer's solution at 37 ℃

Fig.7 General XPS spectrum (a) and fine spectra of Nb 3d (b) and O 1s (c) of the passive film formed on the Nb coating after potentiostatic polarization at 1.0 V for 1 h in Ringer's solution at 37 ℃

Fig.8 Mott-Schottky test results of the Nb coating (a) and TC4 substrate (b) in Ringer's solution at 37 °C

Table 3 Capacitances of the passive films formed on the Nb coating and Ti-6Al-4V substrate in Ringer's solution at 37 ℃

Fig.9 Variations of donor density of the Nb coating (a) and Ti-6Al-4V substrate (b) with film-forming potential

Fig.10 Variations of capacitance and thickness of passivation films of the Nb coating and substrate with film-forming potential

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