电沉积防护性硅烷薄膜的研究现状与展望

中国腐蚀与防护学报

2011, Vol. 31

Issue (1): 1-9

综述

本期目录 | 过刊浏览

电沉积防护性硅烷薄膜的研究现状与展望

胡吉明¹,杨亚琴¹,张鉴清^1,2,曹楚南^1,2

1. 浙江大学化学系杭州 310027
2．中国科学院金属研究所腐蚀与防护国家重点实验室沈阳110016

PROGRESS AND PROSPECTIVE IN ELECTRODEPOSITED ANTI-CORROSIVE SILANE FILMS

HU Jiming¹, YANG Yaqin¹, ZHANG Jianqing^1,2, CAO Chu'nan^1,2

1. Department of Chemistry,Zhejiang University, Hangzhou 310027
2．State Key Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016

全文: PDF(44 KB)

摘要: 介绍电沉积硅烷Sol-gel薄膜的原理、方法、用途与研究进展，并着重介绍电沉积硅烷薄膜在金属表面防护处理中的应用。针对防护性的特殊要求，提出电沉积硅烷薄膜研究中的难点与展望。

关键词 ：硅烷膜, 电沉积, 防腐蚀, 进展

Abstract：The principles, methodologies and implications of electrochemically generated silane film materials are reviewed along with some selected recent trends in the fields of functionalized and anti-corrosive sol-gel silica/organosilica films. As a major concern, the recent trends of the electro-assisted generation of organosilica films for corrosion protection are emphasized. The difficulties and the prospective in the study of electrodeposited anti-corrosive silane films are also discussed.

Key words： silane film electrodeposition corrosion protection progress

收稿日期: 2010-11-02

ZTFLH:

TG178

基金资助:

国家自然科学基金（50871101）、浙江省自然科学基金（Z4100016）及浙江省钱江人才计划项目（2010R10046）资助

通讯作者: 胡吉明 E-mail: kejmhu@zju.edu.cn

Corresponding author: HU Jiming E-mail: kejmhu@zju.edu.cn

作者简介: 胡吉明，男，1974年生，教授，研究方向为金属表面环保型防护处理

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引用本文:

胡吉明,杨亚琴,张鉴清,曹楚南. 电沉积防护性硅烷薄膜的研究现状与展望[J]. 中国腐蚀与防护学报, 2011, 31(1): 1-9.
HU Ji-Meng, YANG Ya-Qin, ZHANG Jian-Qing, CAO Chu-Na. PROGRESS AND PROSPECTIVE IN ELECTRODEPOSITED ANTI-CORROSIVE SILANE FILMS. J Chin Soc Corr Pro, 2011, 31(1): 1-9.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y2011/V31/I1/1

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