硼酸-硼砂缓冲液中铁的孔蚀及缓蚀剂PC-604作用的光电化学研究

中国腐蚀与防护学报

1996, Vol. 16

Issue (4): 269-274

研究报告

本期目录 | 过刊浏览

硼酸-硼砂缓冲液中铁的孔蚀及缓蚀剂PC-604作用的光电化学研究

杨迈之;陈利;蔡生民

北京大学化学与分子工程学院

A PHOTOELECTROCHEMICAL STUDY OF PITTING AND USE OF INHIBITOR PC-6O4 ON ISON IN BORATE BUFFER SOLUTION

YANG Maizhi; CHEN Li; CAI Shengmin (Department of Chemistry; Beijing University; Beijing 100871)

全文: PDF(477 KB)

摘要: 采用光电化学方法对纯铁在ｐＨ＝８．４的硼酸－硼砂缓冲液中的孔蚀现象及缓蚀剂ＰＣ－６０４的作用进行了研究。结果表明，加入不同量的缓蚀剂后，铁表面饨化膜的禁带宽度没有发生变化，但是光电流信号却随缓蚀剂量的增加而增大了。从光电流暂态谱的研究中首次提出了钝化膜的膜参数的概念，并用以衡量钝化膜的抗孔蚀能力。

关键词 ：光电化学, 铁, 孔蚀, 缓蚀剂

Abstract：The photoelectrochemical behavior of iron and its susceptibility to pitting in a borate buffer solution ofpH8.4 were studied in the presence and absence of inhibitor PC-604. The aim of this work was to analyze the relationship between character of passivation film and pitting on iron. Pure iron was anodically passivated in the solution for different durations in the presence and absence of the inhibitor, then Cl- was added in, and the change of dark current Id and photocurrent IPh with time was observed. When passivation time passed 24h or the quantity of the inhibitor exceeded 20ppm, pitting could not be initiated.The Eg of the passive film on iron was measured at different inhibitor concentrations and passivatinn durations.Results implied that the Eg data did not vary apparently.But the photocurrent increased with increasing passivation time or inhibitor concentration. It meant the inhibitor did not interfere with the energy level structure of the sc miconductor-passivation film.From transient photocurrent image t he so-called film parameter of passivation film was deterndnd. It was found that at a given passivation time, the film parameter increased with increasing quantity of inhibitor,and at a given concentration of inhibitor,the film parameter increased with increasing passivation time too. It was significant that the role of this inhibitor was to promote efficient passivation. The film parameter was related to the thickness and the compactness of the passive film.

Key words： Photoelectrochemical Iron Pitting Inhibitor

收稿日期: 1996-08-25

基金资助:国家教委优秀年轻教师基金;;北京大学分子动态及稳态结构国家重点实验室开放基金

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杨迈之;陈利;蔡生民. 硼酸-硼砂缓冲液中铁的孔蚀及缓蚀剂PC-604作用的光电化学研究[J]. 中国腐蚀与防护学报, 1996, 16(4): 269-274.
. A PHOTOELECTROCHEMICAL STUDY OF PITTING AND USE OF INHIBITOR PC-6O4 ON ISON IN BORATE BUFFER SOLUTION. J Chin Soc Corr Pro, 1996, 16(4): 269-274.

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https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1996/V16/I4/269

1BardwellJA,MacDougallB．Electrochim．Acta,1989,34:2292杜天保,杨迈之,陈慎豪,陈利,曹楚南．中国腐蚀与防护学报,1995,15(4):2853王清．第八届全国缓蚀剂学术讨论会论文集,武汉:1993．p1814ChenSH,CaiSM．ElectrochimicaActa,1989,34:5635ButlerMA．J．appl．Phys．1977,48:19146KennedyJH,AndermannM．JElectrochem．Soc,1983,130:8487AbrantesLM,PeterLM．J．Electroanal．Chem,1983,150:593

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