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低阴极沉积电位对铝合金表面硅烷膜层的影响 |
徐以兵;何德良;周舟;钟建芳;许 超;崔正丹;曾丽萍 |
湖南大学化学生物传感与计量学国家重点实验室 长沙 410082 |
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EFFECTS OF LOW CATHODIC POTENTIAL ON ELECTRODEPOSITED SILANE FILMS ON ALUMINUM ALLOY |
XU Yibing; HE Deliang; ZHOU Zhou; ZHONG Jianfang; XU Chao; CUI Zhengdan; ZENG Liping |
College of Chemistry and Chemical Engineering; Hunan University; Changsha 410082 |
引用本文:
徐以兵 何德良 周舟 钟建芳 许 超 崔正丹 曾丽萍. 低阴极沉积电位对铝合金表面硅烷膜层的影响[J]. 中国腐蚀与防护学报, 2009, 29(3): 220-224.
HE De-Liang,
XU Si-Bing,
ZHOU Zhou,
ZHONG Jian-Fang,
XU Tiao,
CUI Zheng-Dan.
EFFECTS OF LOW CATHODIC POTENTIAL ON ELECTRODEPOSITED SILANE FILMS ON ALUMINUM ALLOY. J Chin Soc Corr Pro, 2009, 29(3): 220-224.
链接本文:
https://www.jcscp.org/CN/
或
https://www.jcscp.org/CN/Y2009/V29/I3/220
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