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1.10-菲啰啉在以HCHO为还原剂的化学镀铜体系中的作用 |
赵 晴 张传波 王帅星 杜 楠 赵 琳 李园园 |
南昌航空大学 轻合金加工科学与技术国防重点学科实验室 南昌 330063 |
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Effect of 1.10-phenanthroline on Electroless Copper Plating Using Formaldehyde as Reductant |
ZHAO Qing, ZHANG Chuanbo, WANG Shuaixing, DU Nan, ZHAO Lin, LI Yuanyuan |
National Defense Key Disciplines Laboratory of Light Alloy Processing Science and Technology, Nanchang Hangkong University, Nanchang 330063, China |
引用本文:
赵晴, 张传波, 王帅星, 杜楠, 赵琳, 李园园. 1.10-菲啰啉在以HCHO为还原剂的化学镀铜体系中的作用[J]. 中国腐蚀与防护学报, 2013, 33(6): 515-520.
ZHAO Qing,
ZHANG Chuanbo,
WANG Shuaixing,
DU Nan,
ZHAO Lin,
LI Yuanyuan.
Effect of 1.10-phenanthroline on Electroless Copper Plating Using Formaldehyde as Reductant. Journal of Chinese Society for Corrosion and protection, 2013, 33(6): 515-520.
链接本文:
https://www.jcscp.org/CN/
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https://www.jcscp.org/CN/Y2013/V33/I6/515
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