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中国腐蚀与防护学报  2025, Vol. 45 Issue (3): 687-697     CSTR: 32134.14.1005.4537.2024.080      DOI: 10.11902/1005.4537.2024.080
  研究报告 本期目录 | 过刊浏览 |
烧结NdFeB表面HEDP-焦磷酸钾体系电镀铜工艺及性能研究
王康1,2, 姜建军2, 杨丽景2, 宋振纶2()
1.宁波大学机械工程与力学学院 宁波 315211
2.中国科学院宁波材料技术与工程研究所 中国科学院磁性材料与器件重点实验室 浙江省磁性材料及其应用技术重点实验室 宁波 315201
Copper Electroplating Process and Performance of HEDP-potassium Pyrophosphate System on Sintered NdFeB Surface
WANG Kang1,2, JIANG Jianjun2, YANG Lijing2, SONG Zhenlun2()
1.Faculty of Mechanical Engineering & Mechanics, Ningbo University, Ningbo 315211, China
2.Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
引用本文:

王康, 姜建军, 杨丽景, 宋振纶. 烧结NdFeB表面HEDP-焦磷酸钾体系电镀铜工艺及性能研究[J]. 中国腐蚀与防护学报, 2025, 45(3): 687-697.
Kang WANG, Jianjun JIANG, Lijing YANG, Zhenlun SONG. Copper Electroplating Process and Performance of HEDP-potassium Pyrophosphate System on Sintered NdFeB Surface[J]. Journal of Chinese Society for Corrosion and protection, 2025, 45(3): 687-697.

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摘要: 

研究了利用羟基乙叉二膦酸(HEDP)作为无氰碱性电镀体系、焦磷酸钾作为辅助络合剂在NdFeB表面进行Cu电镀的工艺。采用循环伏安法(CV)、阴极电流效率、霍尔槽实验、扫描电子显微镜(SEM)等手段对电镀工艺进行优化;利用SEM、划格实验等方法对电镀镀层进行表征分析,讨论了不同镀层的耐腐蚀性能及其对磁体表磁的影响。结果表明,当各组分浓度分别为CuSO4·5H2O 22.5 g·L-1、HEDP 60 g·L-1、K4P2O7 40 g·L-1、K2SO4 10 g·L-1、pH = 10、温度50 ℃、搅拌速率200 r·min-1、电流密度0.6 A/dm2时,得到的镀层表面光滑无缺陷,结合力良好,耐腐蚀性能与常规的Ni-Cu-Ni镀层接近;表磁和磁通量结果表明在NdFeB表面直接电镀Cu对磁体的磁屏蔽作用小于Ni-Cu-Ni镀层。

关键词 电镀Cu无氰碱性HEDP阴极电流效率结合力表磁    
Abstract

The Cu electroplating on sintered NdFeB was conducted with hydroxyethylidene diphosphonic acid (HEDP) as a cyanide-free alkaline plating electrolyte and potassium pyrophosphate as an auxiliary complexing agent. Meanwhile, the plating process was optimized through cyclic voltammetry (CV), cathodic current efficiency, Hall tank experiments, scanning electron microscopy (SEM) and other means; then the plated coatings were characterized by means of SEM and scratch test etc., and their corrosion resistance was assessed by salt spray test. The results showed that the coatings with smooth surface, defect free and good adhesion to the NdFeB substrate may be acquired with an electrolyte composed of CuSO4·5H2O 22.5 g·L-1, HEDP 60 g·L-1, K4P2O7 40 g·L-1 and K2SO4 10 g·L-1 of pH = 10, at 50 ℃, by stirring rate of 200 r·min-1, and current density of 0.6 A·dm-2. The corrosion resistance of the Cu-plating is close to that of conventional Ni-Cu-Ni plating; Besides, the surface magnetic and magnetic flux results show that the magnetic shielding effect of direct Cu plating on NdFeB surface is smaller than that of Ni-Cu-Ni plating.

Key wordselectroplated Cu    cyanide-free alkaline    HEDP    cathode current efficiency    binding force    table magnetic
收稿日期: 2024-03-13      32134.14.1005.4537.2024.080
ZTFLH:  TG174  
基金资助:国家重点研发计划(2021YFB3502900)
通讯作者: 宋振纶,E-mail:songzhenlun@nimte.ac.cn,研究方向为材料表面防护技术
Corresponding author: SONG Zhenlun, E-mail: songzhenlun@nimte.ac.cn
作者简介: 王 康,男,1998年生,硕士生
Ingredient and conditionRange
CuSO4·5H2O15-40 g·L-1
HEDP50-80 g·L-1
K₄P₂O₇10-60 g·L-1
K2SO410 g·L-1
pH8-11
Current density0.3-1.5 A·dm-2
Temperature30-60 ℃
Stirring rate200 r·min-1
表1  电镀Cu的溶液组成及实验条件
Ingredient and conditionVariable 1Variable 2Variable 3Variable 4Variable 5Variable 6Variable7
CuSO4·5H2O / g·L-1152022.525303540
HEDP / g·L-150607080---
K4P2O7 / g·L-110204060---
Current density / A·dm-20.30.60.91.21.5--
pH891011---
Temperature / ℃30405060---
表2  单一变量实验的对象和条件
图1  霍尔槽试片镀层外观示意图
图2  含有不同浓度CuSO4的HEDP碱性镀Cu液中的CV曲线
图3  HEDP电镀体系pH滴定过程
图4  3种组分的浓度对阴极电流效率的影响
图5  在含不同HEDP和焦磷酸钾浓度的镀液中所沉积镀层的表面SEM形貌
图6  霍尔槽阴极试片标准带
图7  不同条件下的霍尔槽试片表面直观图
图8  不同电流密度下的镀层表面SEM形貌
图9  不同电流密度下的镀层截面轮廓和3D形貌
图10  含有不同辅助络合剂的镀液所得到的镀层SEM形貌
图11  含有不同络合剂的镀液得到的镀层截面形貌
图12  纯Cu镀层的截面形貌
图13  Cu镀层的划格实验
图14  施镀3种不同镀层的样品在NSS下不同时间腐蚀实验后的宏观形貌
图15  施镀不同镀层钕铁硼试样的表磁和磁通量
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