Comparative Study on Passive Behavior of Wire Arc Additive Manufactured, Selective Laser Melted, and Conventional TC4 Ti-alloys

doi:10.11902/1005.4537.2025.266

Journal of Chinese Society for Corrosion and protection

2026, Vol. 46

Issue (1): 186-192 DOI: 10.11902/1005.4537.2025.266

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Comparative Study on Passive Behavior of Wire Arc Additive Manufactured, Selective Laser Melted, and Conventional TC4 Ti-alloys

LI Kexuan¹, WANG Yipeng², LIAO Bokai³(

)

^1.Ningbo University of Technology, School of Materials and Chemical Engineering, Ningbo 315200, China
^2.College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
^3.School of Chemistry and Chemical Engineering, Guangzhou University, Guangzhou 510006, China

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LI Kexuan, WANG Yipeng, LIAO Bokai. Comparative Study on Passive Behavior of Wire Arc Additive Manufactured, Selective Laser Melted, and Conventional TC4 Ti-alloys. Journal of Chinese Society for Corrosion and protection, 2026, 46(1): 186-192.

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Abstract

TC4 Ti-alloy has garnered significant attention in industrial applications due to its excellent comprehensive properties, but its difficult machinability makes additive manufacturing technologies a promising alternative processing method. Hence, in the article, the passivation behavior of three TC4 Ti alloys fabricated by wire arc additive manufacturing (WAAM), selective laser melting (SLM) additive manufacturing and conventional forging was comparatively assessed by means of electrochemical testing in 3.5%NaCl solution of pH = 6.8 ± 0.2 at 25 ^oC, and XPS analysis. The results demonstrate that while the passive films formed on the three alloys share similar characteristics in primary constituent elements and semiconducting properties, but notable differences exist in the relative proportions of constituents and defect concentrations of films.

Key words: wire arc additive manufacturing (WAAM) selective laser melting (SLM) TC4 Ti-alloy passivation

Received: 25 August 2025 32134.14.1005.4537.2025.266

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	LI Kexuan
	WANG Yipeng
	LIAO Bokai

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https://www.jcscp.org/EN/10.11902/1005.4537.2025.266 OR https://www.jcscp.org/EN/Y2026/V46/I1/186

Fig.1 EBSD results of traditional TC4 (a), SLM-TC4 (b) and WAAM-TC4 Ti-alloys (c): (a1, b1, c1) IPF map; (a2, b2, c2) grain boundary map; (a3, b3, c3) pole map; (a4, b4, c4) grain size map

Fig.2 XRD spectra of SLM, WAAM and traditional TC4 Ti-alloys

Fig.3 Open circuit potential (OCP) of SLM, WAAM and traditional TC4 Ti-alloys after soaking for 1800 s

Fig.4 Dynamic potential polarization curves of SLM, WAAM and traditional TC4 Ti-alloys

Table 1 Fitting results of dynamic potential polarization curves for SLM, WAAM and traditional TC4 Ti-alloys

Fig.5 Potentiostatic diagram of SLM, WAAM and traditional TC4 Ti-alloys: (a) overall view, (b) enlarged view of the red-framed area, (c) enlarged view of the yellow-framed area

Fig.6 Logarithmic treatment diagram of constant potential polarization for SLM, WAAM and traditional TC4 Ti-alloys after soaking for 1800 s

Fig.7 M-S curves on SLM, WAAM and traditional TC4 Ti-alloys

Fig.8 N_D values of passivation films on SLM, WAAM and traditional TC4 Ti-alloys

Fig.9 XPS results of passivation films on traditional TC4 (a), SLM-TC4 (b) and WAAM-TC4 Ti-alloys (c): (a1-c1) Ti spectra, (a2-c2) O spectra

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