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INFLUENCES OF ADDITIVES ON ELECTROLESS THICK COPPER PLATING BASED ON THPED SYSTEM |
SHEN Xiaoni1,2, ZHAO Dongmei1, REN Fengzhang1, TIAN Baohong1
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1. School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang 471003
2. Henan Key Laboratory of Advanced Nonferrous Metal Materials,Luoyang 471003 |
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Abstract The influences of additives on plating rate, coating quality and bath stability were investigated to develop THPED-EDTA•2Na thick copper plating process. The plating rate is obviously increased by proper amount of L-arginine, and its proper dosage is 0.15 mg•L-1; the coating quality is greatly improved by proper amount of PEG and ferrous potassium cyanide in spite of slight decrease of plating rate, and the proper amount are 150 mg•L-1 and 20 mg•L-1, respectively. The stability of bath is enhanced by all these additives and the stability time of bath in which mixed additives is added reaches the highest of 5 h at 80℃. The plating rate is 7.10 μm•h-1 and the backlight level achieves 10th grade under appropriate conditions after plating for 15 min. The coating is red, bright and uniform, the sedimentary layer is cubic copper and the crystal of copper coating is mainly assigned to the (111) face.
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Received: 21 July 2010
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Corresponding Authors:
REN Fengzhang
E-mail: lyrenfz@163.com
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