THERMAL OXIDATION OF Ti TOP FILM OF Ti/Al COATING ON URANIUM

J Chin Soc Corr Pro

2005, Vol. 25

Issue (3): 171-175 DOI:

Research Report

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THERMAL OXIDATION OF Ti TOP FILM OF Ti/Al COATING ON URANIUM

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Abstract The chemical structure of Ti film of the dual coating Ti/Al on uranium prepared by magnet-sputtering ion plating technique were studied by electron energy loss spectrum (EELS) and auger electron spectrum (AES) in 6.5×10-6Pa and 0.05 MPa O2 in the range of 150℃～500℃.The oxides formed during the oxidation of both the Ti film and bulk metal Ti depend on temperature and oxygen pressure.In 0.05 MPa O2,TiO2 was formed in the range of 200℃ to 500℃ due to an adequate single oxygen on the Ti coating and the bulk metal Ti surface.In 6.5×10-6Pa O2 atmosphere,Ti of film and bulk metal grad ually turn into TiO,Ti2O3 and TiO2 with an adequate single oxygen at 150℃ and 250℃,however beyond 400℃,only TiO was formed on Ti film with an inadequate single oxygen resulted from O diffusive rate increase.Moreover,compared with the bulk metal Ti,O diffusion rate in the Ti film became fast due to the increase of grain boundary concentration.The experimental results are discussed thermody namically.

Key words: Ti coating thermal oxidation EELS uranium

Received: 17 November 2003

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TG172.6+3

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. THERMAL OXIDATION OF Ti TOP FILM OF Ti/Al COATING ON URANIUM. J Chin Soc Corr Pro, 2005, 25(3): 171-175 .

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https://www.jcscp.org/EN/ OR https://www.jcscp.org/EN/Y2005/V25/I3/171

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