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Abstract Electrodeposited Ni-P amorphous alloy was implanted with chromiu at 150 keV in dosage of(1,3,5)×10~(17)ions·cm~(=2). During implantation of Cr~+ ion,carbon from the residual gases in the vacuum chamber could reach the implanting layer assisted by absorption- diffusion and formed Ni-Cr-P-C layer on the surface of Ni-P. The distribution of Ni,Cr,P and C in the implanted layer was examined by means of SIMS.TEM observation proved that the surface Ni-Cr-P-C was amorphous. The modification of the corrosion properties of the amorphous surface alloys was studied by dynamic polarization in 1M H_2SO_4 and 1M HCl. The experimental results showed that Cr-implantation not only had beneficial effect on the active-passive behavior of electrodeposited Ni-P in 1M H_2SO_4,but also increased,the pitting resistance of the Ni-P in the 1M HCl solution.
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Received: 25 February 1989
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[1] Clayton,C.R.,et al,Ion implantation into Metal,Ashworth,Ed Pergamon press,Oxford and New York.(1982) [2] Clayton,C.R.,Nuclear Instruments and Methods 182/183 865(1981) [3] Wang Jiyin,Shan Guoyou,Proceedings of Conference 26 Australasian Corrosion Association Inc.,Vol.Ⅲ,(1986) [4] Singer,I.L.,J.Vac.Sci.Technol.,A,1(2) ,421(1983) [5] Singer,I.L.,Appl.Phys.Lett,43,457(1983) [6] Dillich,S.A.,et al,Thin Solid Films,108,219(1983) [7] Hashimoto,K.,et al,防腐技术,26,445(1977) [8] Hashimoto,K.,et al,Proceedings of the 8th ICMC,1,70(1981) |
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