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J Chin Soc Corr Pro  1989, Vol. 9 Issue (1): 63-66    DOI:
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ELECTROCHEMICAL BEHAVIOUR OF Cr ION IMPLANTE D Ni-P AMORPHOUS ALLOY
Wang Jiyin and Shan Guoyou (Institute of Corrosion and Protection of Metals Academia Sinica)
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Abstract  Electrodeposited Ni-P amorphous alloy was implanted with chromiu at 150 keV in dosage of(1,3,5)×10~(17)ions·cm~(=2). During implantation of Cr~+ ion,carbon from the residual gases in the vacuum chamber could reach the implanting layer assisted by absorption- diffusion and formed Ni-Cr-P-C layer on the surface of Ni-P. The distribution of Ni,Cr,P and C in the implanted layer was examined by means of SIMS.TEM observation proved that the surface Ni-Cr-P-C was amorphous. The modification of the corrosion properties of the amorphous surface alloys was studied by dynamic polarization in 1M H_2SO_4 and 1M HCl. The experimental results showed that Cr-implantation not only had beneficial effect on the active-passive behavior of electrodeposited Ni-P in 1M H_2SO_4,but also increased,the pitting resistance of the Ni-P in the 1M HCl solution.
Received:  25 February 1989     
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Wang Jiyin and Shan Guoyou (Institute of Corrosion and Protection of Metals Academia Sinica). ELECTROCHEMICAL BEHAVIOUR OF Cr ION IMPLANTE D Ni-P AMORPHOUS ALLOY. J Chin Soc Corr Pro, 1989, 9(1): 63-66.

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