PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA

J Chin Soc Corr Pro

1995, Vol. 15

Issue (3): 237-239 DOI:

Current Issue | Archive | Adv Search

PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA

Ren Jujie;Yang Maizhi;Tong Ruting;Cai Shengmin(Hebei Medical College)(Beijing University)(Hebei Normal University)

Download:

PDF(265KB)
Export: BibTeX | EndNote (RIS)

Abstract The corrosion behavior of copper and the inhibition of BTA for copper in 3% NaCl solution have been investigated by photo-electrochemical and XPS met hods. The results show that the surface film of copper in the solution is composed of Cu(I),O2-and Cl-However,CuCl has not been found as the primary component in the surfaCe film.The inhibition of BTA could be attributed to the formation of a protective and adsorptive film on Cu2O.The adsorption of BTA does not change the semiconductive properties of Cu2O on copper.

Received: 25 June 1995

	Service

	E-mail this article
	Add to citation manager
	E-mail Alert
	RSS
	（）
	Articles by authors

Cite this article:

Ren Jujie;Yang Maizhi;Tong Ruting;Cai Shengmin(Hebei Medical College)(Beijing University)(Hebei Normal University). PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA. J Chin Soc Corr Pro, 1995, 15(3): 237-239.

URL:

https://www.jcscp.org/EN/ OR https://www.jcscp.org/EN/Y1995/V15/I3/237

1DiQuartoF．etal．Electrochim．Acta,1985,30:315-3242潘传智,杨迈之,蔡生民,周国定．物理化学学报,1993,9(1):993FengYiqi,ZhouGuoding,CaiShengmin．Electrochim．Acta,1991,36(5//6):1093-10944ZhouGuoding,etal．Bul．Electrochem．,1991,7(2):60-635AruchamyA,ZhouGuoding,FujishimaA．J．Electroanal．Chem,1989,266:397-4086AruchamyA,FujishimaA．J．Electroanal．chem,1988,244:333-3387ArbitAH,NobeK．Corrosion,1965,21:2078SastriVS,PackwoodRH,MoorVE,BednarJ．Proc．SEIC,1985,6:741．

No related articles found!

No Suggested Reading articles found!

Viewed

Full text

Abstract

Cited

Shared

Discussed