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| PHOTOELECTROCHEMICAL RESPONSE OF ANODIC FILM ON NICKEL DURING ITS FORMATION,GROWTH AND BREAKDOWN PROCESSES |
| Yao Suwei;Zhang Guoqing;Guo Hetong(Tianjin University)Tong Ruting(Hebei Normal University) |
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Abstract The photoelectrochemical response of anodic oxide flm on nickel in pH 8.4 borax-borate buffer solution has been investigated. Experimental results show that both passive film and high valence oxide film are n-type semiconductors.The passive film is formed by direct oxidation of nickel on the surface.Its flat band potential and carrier density are -0.68V and 1.3x1020cm-3 respectively.For the high Valence oxide film, a dissolution-deposition process is proposed.During the formation, growth and breakdown of the anodic film, the corresponding changes in photocurrent are monitored. At the initial stage Cl-penetrates into the film, which results in a sudden change in its electronic character and then photocurrent increases remarkably.
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Received: 25 June 1995
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Cite this article:
Yao Suwei;Zhang Guoqing;Guo Hetong(Tianjin University)Tong Ruting(Hebei Normal University). PHOTOELECTROCHEMICAL RESPONSE OF ANODIC FILM ON NICKEL DURING ITS FORMATION,GROWTH AND BREAKDOWN PROCESSES. J Chin Soc Corr Pro, 1995, 15(3): 217-222.
URL:
https://www.jcscp.org/EN/ OR https://www.jcscp.org/EN/Y1995/V15/I3/217
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| 1DrQuartoF,PiazzaS,SunseriC．Electrochim．Acta,1993,38:12MorrisonSR．ElectrochemistryatSemiconductorandOxidizedMetalElectrodes,Plenum,NewYork,19803LenhartSJ,MacDonaldDD．J．Electrochem．Soc,1988,135:10634周国定,张国庆,童汝亭．物理化学学报,1992,8(3):418 |
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