[1] J.A.Mchugh,Radial.Eff.,21,209 (1974) [2] R.R.Hart,H.L.Duniap and O.J.Marsh,J.Appl.phys.,46,1947 (1975) [3] H.H.Anderson.Appl.Phys.,18,131 (1979) [4] U.Littmark and W.O.Hofer,Nucl.Instr.and Math.,168,329 (1980) [5] S.S.Lau,B.Y.Tsaur and K.N.Tu,J.Appl.Phys.,49,4005 (1978) [6] B.Y.Tsaur,Z.L.Liau and J.W.Mayer.Appl.Phys.Lett.,34,168 (1979) [7] B.Y.Tsaur,S.S.Lau and J.W.Mayer,Appl.Phys.Lett.,36,823 (1980) [8] J.W.Mayer.B.Y.Tsaur,S,S.Lau and L-S.Hung,Nucl.Inst.and Meth.,182/183,1~13 (1981) Proceeding of the second International Conference on Ion Beam Modification of Materials,North-Holland 1~13 (1981) [9] R.E.J.Watkins and G.Dearnaley,AERE-R 10180 to be Published. [10] A.Galerie,To be Publish in Corrosion Science. [11] V.Ashworth,W.A.Grant,R.P.M.Procter,Treatise on Materials Science and Technology,18,197 (1980) [12] V.Ashworth,W.A.Grant,R.P.M.Procter and T.C.Wellington,Corros.sci.,16,393 (1979) [13] B.D.Sartwell,A.B.Campbell and P.B.Needham,In “Ion Implantation in Semicoductors”(ed.F.Chernow)Plenum.New.York [14] B.Y.Tsaur,S.S.Lau,L.S.Hung and J.W.Mayer,Nucl,Instr.and Meth.,182/183,67 (1981) [15] B.Hestel,K.Kammholz and J.Diehl,1979 Proc.Ist.conf.on Ion Beam Modification of Materials,1827 (1978) |