Ti-N扩散障碍膜的组织结构及高温热稳定性

中国腐蚀与防护学报

1994, Vol. 14

Issue (3): 247-251

研究报告

本期目录 | 过刊浏览

Ti-N扩散障碍膜的组织结构及高温热稳定性

王家军;孙榆芳;叶锐曾

清华大学材料系;北京有色金属研究总院表面技术中心;北京科技大学材料系

THE STRUCTURE AND HIGH TEMPERATURE STABILITY OF Ti-N FILM AS A DIFFUSION BARRIER

Wang Jiajun(Tsinghua University)Sun Yufang(Central Non-Reffous Research Institute)Ye Ruizeng(University of Science and Technology Beijing)

全文: PDF(1850 KB)

摘要: 研究了多弧离子镀Ｔｉ－Ｎ扩散障碍膜的表面形貌、组织结构及高温热稳定性．发现Ｔｉ－Ｎ膜表面存在大量颗粒物；颗粒物对Ｔｉ－Ｎ膜外磁控溅射涂覆的ＭＣｒＡＩＸ包覆型涂层的组织形态及性能有较大影响．Ｘ射线分析表明：Ｔｉ－Ｎ镀膜由δ－ＴｉＮ、ε－ＴｉＤＮ、α－Ｔｉ等多相组成；δ－ＴｉＮ呈明显｛１１１｝择优取向，但经扩散退火处理后，择优取向消失．１０００℃热时效试验结果表明Ｔｉ－Ｎ膜的高温热稳定性良好，与基体及相邻ＭＣｒＡＩＸ镀层间不发生显著互扩散，因而可作为扩散障碍层用于抑止或减缓合金元素在ＧＨ２２０基体及ＭＣｒＡｌＸ涂层间的互扩散．

关键词 ：Ｔｉ－Ｎ镀膜, 择优取向, 热稳定性

Abstract：The surface morphology, structure and high temperature stability of multi-arc plated Ti-N film as a diffusion barrier on nickel-based alloy GH220 have been studied. A lot of palticales which are found on surface of the Ti-N film have great influence on the structure and properties of the magnetic-controlled sputtered MCrAIX coating overlaying the Ti-N film. X-ray diffraction analysis indicates that the Ti-N film consists of δ-TiN, ε-Ti2N, α-Ti, etc. The δ-TiN in the Ti-N film has a strongly preferred {111} orientation,　but the preference disappears after the film is diffusion-annealed. Experimental results of aging at 1000℃　demonstrate that the Ti-N film is of good high temperature stability, and the elemental Ti in Ti-N film does not inter-diffuse towards either GH220 alloy or MCrAIX coating. Thus it could be concluded that Ti-N film can be used as a diffusion barrier to prevent the alloying elements from inter-diffusion or slow down the rate of inter-diffusion of alloying elements between the substrate and MCrAIX coating.

Key words： Multi-arc plated Ti-N film Preferred orientation High temperature stability

收稿日期: 1994-06-25

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引用本文:

王家军;孙榆芳;叶锐曾. Ti-N扩散障碍膜的组织结构及高温热稳定性[J]. 中国腐蚀与防护学报, 1994, 14(3): 247-251.
. THE STRUCTURE AND HIGH TEMPERATURE STABILITY OF Ti-N FILM AS A DIFFUSION BARRIER. J Chin Soc Corr Pro, 1994, 14(3): 247-251.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1994/V14/I3/247

1HsuLL．SurfaceandCoatingsTechnolgy,1987,32:12RestallJE．TheDevel．ofGasTurb．Mater．;Appl．Sci,London,1981,2803MeruthesJP．ConfonCompositedandAdvancedCeramicMaterials,NASALewisResearchCenter,ClevelandtOH,1981:6044CoedJD,RickerbyUS,OberlanderN．Mater．Sci．andEng,1985,74:935YoungSG,ZellarsGR．ThinSolidFilms;1978,53:2416叶锐曾,王家军等．北京科技大学学报,1991;13:5947凌利．真空,1988,(2):128王家军,北京科技大学硕士学位论文,1990,939闻立时等．材料保护,1992,25(2):2410HinotanlS,OhomorlY．Thans．JIM,1988,29(2):116

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