铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅱ.临界H~+浓度的数学模型及其验证

中国腐蚀与防护学报

1990, Vol. 10

Issue (2): 97-108

研究报告

本期目录 | 过刊浏览

铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅱ.临界H~+浓度的数学模型及其验证

刘海平;徐源;张文奇

北京有色金属研究总院腐蚀室;北京科技大学表面科学与腐蚀工程系;北京科技大学表面科学与腐蚀工程系

A MECHANISM OF REANODIZING POROUS ANODIC FILMS ON ALUMINIUM IN (NH_4)_2MoS_4 AQUEOUS SOLUTION Ⅱ. MATHEMATtC MODEL OF THE CRITICAL H~+ CONCENTRATION

Liu Haiping. Xu Yuan and Zkang Wenqi (University of Scieoce & Technology Beijing)

全文: PDF(2873 KB)

摘要: 由己提出的离子迁移模型推导出在电场助溶作用下膜/溶液界面阻挡层生长速度下降时,即溶液对膜具有溶解作用时的孔中酸化溶液的临界H~+浓度公式。研究了公式中各因素对V-t曲线参数的影响,实验结果与理论分析相吻合。改进了超薄切片样品制备方法使之适用于观察厚度大于20～30μm的多孔膜的底部结构。超薄切片的透射电镜观察表明,阻挡层厚度与电压成正比,二次阳极氧化后阻挡层厚度增加,但没有出现对应大孔径的孔起源,原多孔膜部份不变,孔中可观察到副反应产生的疏松沉积物,阻挡层中可见到规则的原多孔膜结构单元和孔的痕迹。

Abstract：It is proposed that a critical concentration of hydrogen ion in pores of the anodic film exists, above which the film material at pore bases dissolves during reanodizing process. A formula on the critical hydrogen ion concentration is derived, based on ion diffusion model.Good agreement is reached between the experimental results and the theoretical predictions from the formula.The improved sample preparation technique in ultramicrotomed sectioning used in this work, allowed direct observation of pore bases of thick porous films(20～30μm) in TEM. Morphological features of the microstructure of the film and the deposited loose molybdenum sulphide are described.

收稿日期: 1990-04-25

基金资助:国家自然科学基金

	服务

	把本文推荐给朋友
	加入引用管理器
	E-mail Alert
	RSS
	作者相关文章
	刘海平
	徐源
	张文奇
44.8K

引用本文:

刘海平;徐源;张文奇. 铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅱ.临界H~+浓度的数学模型及其验证[J]. 中国腐蚀与防护学报, 1990, 10(2): 97-108.
. A MECHANISM OF REANODIZING POROUS ANODIC FILMS ON ALUMINIUM IN (NH_4)_2MoS_4 AQUEOUS SOLUTION Ⅱ. MATHEMATtC MODEL OF THE CRITICAL H~+ CONCENTRATION. J Chin Soc Corr Pro, 1990, 10(2): 97-108.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1990/V10/I2/97

[1] Bockris, John O'.M., and Reddy, Amulya K.N., Modern Electrochemistry., Vol.2, London, Macdonald (1970) .
[2] 北京钢铁学院腐蚀工程系,“腐蚀电化学”,(自编教材)(1983)
[3] 刘海平、徐源、张文奇,中国腐蚀与防护学报,10(2) ,89(1990)
[4] 田昭武,电化学研究方法,科学出版社(1984)
[5] Alvey.C.E., Ph.D.Thesis UMIST(1974)
[6] O'Sullivan.J.P.and Wood.G.C., Proc.Roy.Soc, A317, 511(1970)
[7] Dorsey.G.A., J.Electrochem.Soc., 117, 1181 (1970)
[8] Wood.G.C., In "Oxide and oxide films", Ed, Diqqle.J.W., Vol.2, P167-269,Dekker, New York (1973)
[9] Skeldon.P. Thompson.G.E.and Wood.G.C., Thin Solid Films., 148,333 (1987)

No related articles found!

Viewed

Full text

Abstract

Cited

Shared

Discussed