铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅰ.二次阳极氧化过程中孔中溶液酸度变化对V—t曲线的影响

中国腐蚀与防护学报

1990, Vol. 10

Issue (2): 89-96

研究报告

本期目录 | 过刊浏览

铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅰ.二次阳极氧化过程中孔中溶液酸度变化对V—t曲线的影响

刘海平;徐源;张文奇

北京有色金属研究总院腐蚀室;北京科技大学;北京科技大学

MECHANISM OF REANODIZING POROUS ANODIC FILMS ON ALUMINIUM IN (NH_4 )_2 M0S_4 AQUEOUS SOLUTION Ⅰ. THE EFFECT OF CHANGE OF SOLUTION ACIDITY IN PORES ON V-t TRANSIENTS DURING REANODIZING AT CONSTANT CURRENT DENSITY

Liu Haiping Xu Yuan and Zhang Wenqi (University of Science & Technology Beijing)

全文: PDF(681 KB)

摘要: 通过分析铝的多孔型膜在(NH_4)2MoS_4水溶液中恒电流密度下二次阳极氧化时对应的电压与时间关系曲线,提出如下机理:二次阳极氧化过程中,孔中溶液酸度的变化引起电场助溶作用下孔中溶液对阻挡层溶解能力的变化,因而在二次阳极氧化的不同阶段阻挡层的厚度不同。对应的电压与时间关系曲线则反映了阻挡层厚度的变化。建立了孔中OH~-和MoS_4~(2-)等离子的迂移模型。

Abstract：A mechanism of reanodizing porous anodic films on aluminium in(NH_4)_2MoS_4 aqueous solution at various constant current densities is proposed by analysing the voltage time transients. It is suggessted that the acidity change of the solution in pores causes the change of aggressiveness of solution to the film. The change of aggressiveness, in conjuction with the action of electric field assisted dissolution, results in the thickness variation of barrier layer in different stages of reanodizing. The V-t transients reflect the change of the barrier layer thickness. A model of ion migration in pore channels is postulated.

收稿日期: 1990-04-25

基金资助:国家自然科学基金

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刘海平;徐源;张文奇. 铝的多孔型膜在(NH_4)_2MoS_4水溶液中二次阳极氧化时膜的生长机理 Ⅰ.二次阳极氧化过程中孔中溶液酸度变化对V—t曲线的影响[J]. 中国腐蚀与防护学报, 1990, 10(2): 89-96.
. MECHANISM OF REANODIZING POROUS ANODIC FILMS ON ALUMINIUM IN (NH_4 )_2 M0S_4 AQUEOUS SOLUTION Ⅰ. THE EFFECT OF CHANGE OF SOLUTION ACIDITY IN PORES ON V-t TRANSIENTS DURING REANODIZING AT CONSTANT CURRENT DENSITY. J Chin Soc Corr Pro, 1990, 10(2): 89-96.

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https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1990/V10/I2/89

[1] Wood.G.C., In "Oxide and Oxide, Films", Ed, biggle.J.W., Vol.2, P.167-269, Dekker, New York (1973)
[2] Hoar.T.P.and Yahalom.J., J.Electrochem.Soc., 110, 614(1963)
[3] Takahashi.H.and Nagayama.M., Electrochim Acta., 23, 279(1978)
[4] Xu.Y., Ph. D Thesis UMIST(1983)
[5] 徐源,Thompson.G E.,Wood.G.C.,中国腐蚀与防护学报,8,1(1988)
[6] Kato.M., et al., Proceedings of 10th World Congress in Metal Finishing, Ed., Harayams.S., 250, Metal Finishing Soc. of Jpn(1980)
[7] O'Sullivan.J.P.and Wood.G.C., Proc.Roy.Soc, A317, 511(1970)
[8] Nagayama.M., Takahashi.H.and Kada.M., J.Met.Finish.Soc.Jpn., 30, 2(1979)
[9] Takahashi.H.and Nagayama.M., Corro.Sci., 18, 911(1978)
[10] Thompson.G.E.and Wood.G.C., In "Treatise on Material Science and Technology", Ed., Scully.J.S., 295, Acadimic Press, 1, London (1983)
[11] 刘海平、徐源、张文奇,北京科技大学学报,12,166(1990)
[12] Bailey.J., Ph.D. Thesis, UMIST(1975)
[13] Isawa.k.and Maejima.M., Jpn Pat, 59-14153 (1980)
[14] Isawa.K.and Maejima.M., Metal., No.7, p27(1982) (in Japanese)
[15] Dorsey.G.A., J.Elect rochem.Soc., 117, 1181(1970)

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