非侵蚀性阴离子对薄膜铝孔蚀电位的影响

中国腐蚀与防护学报

1988, Vol. 8

Issue (4): 324-328

研究报告

本期目录 | 过刊浏览

非侵蚀性阴离子对薄膜铝孔蚀电位的影响

戴金华;张挺芳

广西大学化学系;华东师范大学

EFFECTS OF NON-AGGRESSIVE ANIONS ON CRITICAL PITTING POTENTIAL OF THIN-FILM ALUMINUM

Dai Jinhua and Zhang Tingfang (East China Normal University)

全文: PDF(401 KB)

摘要: <正> 一、引言孔蚀与许多因素有关。侵蚀离子的种类、浓度、溶液pH值及温度对点蚀都有影响。溶液中非侵蚀性阴离子(本文用Mp表示)的存在通常能减轻或抑制孔蚀。18-8不锈钢浸在室温3％NaNO_3+3％NaCl溶液里可25年不出现孔蚀。向含Cl~-的溶液中加入适量的NO_3~-或CrO_4~(2-)

Abstract：The effects of non-aggressive anions Mp (NO_3~(2-), CrO_4~(2-), SO_4~(2-))in sodium chloride solution on the critical pitting potential E_c of a thin aluminum film in integrated circuit were studied. It was found that these ions shifted E_c to more noble values and, up to a given concentration of chloride, E_C and [Mp], followed the relation: E_c=a+blog[Mp]. From the preceding relations for several concentration of chlorides, an equation log[Cl~-]=Alog [Mp] +B was obtained. The efficiency of inhibition decreased in the order: NO_3~->CrO_4~(2-)》SO_4~(2-). It was supposed that the cause of inhibition was the reversible competitive adsorption of non-aggressive anions with chloride ion, and the difference of inhibition efficiency depended mostly on the oxidation ability of these anions.

收稿日期: 1988-08-25

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引用本文:

戴金华;张挺芳. 非侵蚀性阴离子对薄膜铝孔蚀电位的影响[J]. 中国腐蚀与防护学报, 1988, 8(4): 324-328.
. EFFECTS OF NON-AGGRESSIVE ANIONS ON CRITICAL PITTING POTENTIAL OF THIN-FILM ALUMINUM. J Chin Soc Corr Pro, 1988, 8(4): 324-328.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1988/V8/I4/324

[1] Corrosion Handbook, P. 165, H. H. Uhlig, Editor, John Wiley and Sons Inc., New York, (1984)
[2] Kolotyrkin Ya., Corrosion, 19, 261t (1963)
[3] Pourbaix M., Mathicn L. Klimzack, Corrosion Science, 3, 239 (1963)
[4] Matsuda S., Uhlig H. H., J. Elcctrochcm. Soc., 111, 156(1954)
[5] Leckic H. P., Uhlig H. H., ibid., 113, 1261(1966)
[6] Bohni H., Uhlig H. H., ibid., 116, 906(1969)
[7] Schnable G. L., Comizzoli R. B., RCE Rcvicw, 40, 416(1979)
[8] Forouslis Z. A. and Thubrikar M. J., J. Electrochem. Soc,, 122 1296 (1975)
[9] Nuygen T. H., Foley R. T., J. Electrochem. Soc., 126, 1885(1979)
[10] 郭瑞金,火时中,中国腐蚀与防护学报,6(2) ,113(1986)
[11] Nuygen T. H., Foley R. T., J. Electrochem. Soc., 127, 2563(1980)
[12] Rosonbold I., Maximtschuk W. , Z. Physik Chem., 215, 25(1960)
[13] Bargeron C. B., Bcnson R. C., ibid., 127, 2528(1980)
[14] Edelcanu C., Evans U. R., Transo Faraday Soc., 65, 683 (1949)
[15] Koudelkova M., et al., J. Electrochem. Soc., 124, 1105(1977)

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