N2 流量和靶基距对多弧离子镀沉积AlSiN纳米复合涂层的微观组织及耐腐蚀性能影响

李茂, 邓轲, 陈衍祥, 刘中豪, 李尚, 郭宇婷, 董选普, 曹华堂

Influence of N2 Flow and Target-substrate Distance on Microstructure and Corrosion Resistance Properties of Multi-arc Ion Plated AlSiN Nano-composite Coatings

LI Mao, DENG Ke, CHEN Yanxiang, LIU Zhonghao, LI Shang, GUO Yuting, DONG Xuanpu, CAO Huatang

表1 AlSiN涂层沉积参数

Table 1 Deposition parameters of AlSiN coating by AIP

Procedure Current / A Ar flow L·min-1 N2 gas flow L·min-1 Chamber pressure / Pa Negative bias / V Rotational speed / r·min-1 Temperature℃ Time min Ti AlSi Ar+ etching - - 0.05 - 1.0 400 15 - 10 TiN layer 70 - 0.05 0.10 2.0 50 15 - 5 AlSiN layer - 60 0.05 0.05-0.20 2.0 50 5 200 50