烧结NdFeB表面HEDP-焦磷酸钾体系电镀铜工艺及性能研究
王康, 姜建军, 杨丽景, 宋振纶

Copper Electroplating Process and Performance of HEDP-potassium Pyrophosphate System on Sintered NdFeB Surface
WANG Kang, JIANG Jianjun, YANG Lijing, SONG Zhenlun
表1 电镀Cu的溶液组成及实验条件
Table 1 Bath composition and experimental conditions for copper plating
Ingredient and conditionRange
CuSO4·5H2O15-40 g·L-1
HEDP50-80 g·L-1
K₄P₂O₇10-60 g·L-1
K2SO410 g·L-1
pH8-11
Current density0.3-1.5 A·dm-2
Temperature30-60 ℃
Stirring rate200 r·min-1