Iridium oxide pH electrode | High temperature oxidation | 2~12 | -59.5 mV/pH | <30 s | [35] |
| High temperature oxidation | 1~12 | -58.4 mV/pH | 1~3 min | [34] |
| High temperature oxidation | | | 20~80 s | [48] |
| High-temperature carbonate oxidation | 0~14 | -59~-65 mV/pH | - | [36] |
Cyclic oxidative quenching | 1~13 | -55~-57 mV/pH | 10 s~60 s | [37] |
Electrochemical deposition | 1~13 | -55.5~-65.5 mV/pH | - | [31] |
Constant current deposition | - | -74.91 mV/pH | 67 s | [42] |
Sol-gel method | 1.5~12 | -51.1~-51.7 mV/pH | <2 s | [39] |
Electrochemical deposition | - | -72.5±1.1 mV/pH | - | [45] |
Cyclic voltammetry | - | -57~-72 mV/pH | - | [43] |
Electrochemical deposition | 2.38~11.61 | -59 mV/pH | | [38] |
Silk-screen printing | - | -59 mV/pH | - | [40] |
Melt oxidation | 1~13 | -58.92 mV/pH | <0.2 s | [41] |
Titanium-based pH electrode | Electron impact ion source | 1~12 | -55 mV/pH | 2~5 min | [53] |
| Ionic nitriding | 11~14 | -60 mV/pH | <1 min | [68] |
| Sol-gel method | 1~11 | -58.73 mV/pH | - | [69] |
Tungsten oxide pH electrode | Chemical oxidation | 2~11 | -56.0±0.9 mV/pH | - | [61] |
| Magnetron sputtering | 2~12 | -41 mV/pH | <90 s | [59] |
| Sol-gel method | 2~11 | -52.6 mV/pH | <1 min | [60] |
| Constant groove pressure method | 2~11 | -50 mV/pH | <3 min | [62] |
| Thermal oxidation | 2~12 | -53.83 mV/pH | <1 min | [70] |
Manganese oxide pH electrode | Silk-screen printing | 2~12 | -78.3 mV/pH | - | [64] |