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| High Temperature Oxidation Behavior of Co-20Re-25Cr-1Si Alloy in 0.1 MPa Pure Oxygen |
XU Xunhu1,HE Cuiqun2,XIANG Junhuai1( ),WANG Ling1,ZHANG Honghua1,ZHENG Xiaodong1 |
1. Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, China
2. School of Mechanical and Electronic Engineering, Nanchang Institute of Technology, Nanchang 330099, China |
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Abstract The iso-thermal oxidation behavior of Co-20Re-25Cr-1Si alloy in 0.1 MPa pure oxygen at 1000~1100 ℃ for 24 h was investigated. The oxidation kinetics is irregular at both temperatures. The alloys show obvious mass loss due to the evaporation of Re element in the form of ReO3. However, at 1100 ℃ continuous mass gain occurred during the initial 15 min of oxidation, while at 1000 ℃ the alloys remained in a mass loss state during the whole oxidation process. The scales formed at both temperatures are very similar. The outermost layer is composed of CoO, while the subsequent layer is composed of CoO and CoCr2O4. The innermost layer is a thin and protective layer of Cr2O3 with a certain degree of continuity. Moreover, there is an inner oxidation zone of Si beneath the outer scales. Since the Cr2O3 layer formed at 1000 ℃ is more continuous and denser, the alloy exhibits a better oxidation resistance at 1000 ℃.
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Received: 08 September 2019
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| Fund: Science and Technology Research Program of Jiangxi Provincial Education Department(GJJ160770);Graduate Innovation Fund of Jiangxi Science and Technology Normal University(YC2018-X01) |
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Corresponding Authors:
Junhuai XIANG
E-mail: xiangjunhuai@163.com
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