Continuous Monitoring of Oxygen Chemical Potential on the Surface of Growing Scales and Its Application to High Temperature Oxidation of Metals

中国腐蚀与防护学报

2009, Vol. 29

Issue (4): 319-320

论文摘要

本期目录 | 过刊浏览

Continuous Monitoring of Oxygen Chemical Potential on the Surface of Growing Scales and Its Application to High Temperature Oxidation of Metals

T. MARUYAMA; K. AKIBA; M. H. BIN ANI; M. UEDA; K. KAWAMURA

Department of Metallurgy and Ceramics Sciences Graduate School of Science ande Engineering; Tokyo Institute of Technology S8-11; 2-12-1 O-okayama; Meguro-ku; Tokyo 152-8552; Japan

全文: PDF(180 KB)

收稿日期: 2009-06-29

通讯作者: T. Maruyama E-mail: maruyama@mtl.titech.ac.jp

	服务

	把本文推荐给朋友
	加入引用管理器
	E-mail Alert
	RSS
	作者相关文章
	Toshio Maruyama
	Kojiro Akiba
	Mohd Hanafi Bin Ani
	Mitsutoshi Ueda
	Kenichi Kawamura
44.8K

引用本文:

T. MARUYAMA K. AKIBA M. H. BIN ANI M. UEDA K. KAWAMURA. Continuous Monitoring of Oxygen Chemical Potential on the Surface of Growing Scales and Its Application to High Temperature Oxidation of Metals[J]. 中国腐蚀与防护学报, 2009, 29(4): 319-320.

链接本文:

https://www.jcscp.org/CN/Y2009/V29/I4/319

No related articles found!

Viewed

Full text

Abstract

Cited

Shared

Discussed