铀表面Ti/Al复合镀层中Ti膜表面氧化结构研究

中国腐蚀与防护学报

2005, Vol. 25

Issue (3): 171-175

研究报告

本期目录 | 过刊浏览

铀表面Ti/Al复合镀层中Ti膜表面氧化结构研究

白彬;杨江蓉;陆雷

THERMAL OXIDATION OF Ti TOP FILM OF Ti/Al COATING ON URANIUM

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摘要: 采用电子能量损失谱（EELS）和俄歇电子能谱(AES)研究了铀表面磁控溅射离子镀Ti/Al复合镀层中Ti膜在6.5×10-6PaO2、150℃～400℃和0.05 MPaO2、200℃～500℃环境中表面化学结构变化，并与块状金属Ti的行为进行了比较.结果表明，Ti膜表面结构随着氧化温度和氧分压而变化.在0.05?MPaO2足氧气氛中，在200℃～500℃下氧化时，Ti膜与块状金属Ti表面形成的氧化物均为TiO2.在6.5×10-6PaO2环境中，在较高温度（400℃）下由于表面缺氧Ti膜表面仅形成TiO，在较低温度下（≤250℃）由于O的扩散速度降低，Ti膜逐步向TiO、Ti2O3、TiO2转变，最后在表面形成了TiO2.O在Ti膜中的扩散速度较块状金属Ti明显加快.结合热力学对Ti膜氧化物结构变化进行了讨论.

关键词 ： Ti镀层, 热氧化, 电子能量损失谱, 铀

Abstract：The chemical structure of Ti film of the dual coating Ti/Al on uranium prepared by magnet-sputtering ion plating technique were studied by electron energy loss spectrum (EELS) and auger electron spectrum (AES) in 6.5×10-6Pa and 0.05 MPa O2 in the range of 150℃～500℃.The oxides formed during the oxidation of both the Ti film and bulk metal Ti depend on temperature and oxygen pressure.In 0.05 MPa O2,TiO2 was formed in the range of 200℃ to 500℃ due to an adequate single oxygen on the Ti coating and the bulk metal Ti surface.In 6.5×10-6Pa O2 atmosphere,Ti of film and bulk metal grad ually turn into TiO,Ti2O3 and TiO2 with an adequate single oxygen at 150℃ and 250℃,however beyond 400℃,only TiO was formed on Ti film with an inadequate single oxygen resulted from O diffusive rate increase.Moreover,compared with the bulk metal Ti,O diffusion rate in the Ti film became fast due to the increase of grain boundary concentration.The experimental results are discussed thermody namically.

Key words： Ti coating thermal oxidation EELS uranium

收稿日期: 2003-11-17

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引用本文:

白彬; 杨江蓉; 陆雷 . 铀表面Ti/Al复合镀层中Ti膜表面氧化结构研究[J]. 中国腐蚀与防护学报, 2005, 25(3): 171-175 .

链接本文:

https://www.jcscp.org/CN/Y2005/V25/I3/171

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