两种渗铝涂层在高温熔融碱金属硫酸盐中的腐蚀

中国腐蚀与防护学报

1984, Vol. 4

Issue (4): 251-262

研究报告

本期目录 | 过刊浏览

两种渗铝涂层在高温熔融碱金属硫酸盐中的腐蚀

吴维(山文);A.Rahmel;M.Schorr

中国科学院金属腐蚀与防护研究所;DECHEMAlnstitut;Frankfurt/Main;WestGermany;DECHEMAlnstitut;Frankfurt/Main;WestGermany

CORROSION BEHAVIOR OF Al-DIFFUSION COATINGS ON IN738LC IN ALKALI MELTS AT 1173K

Wu Weitao(Institute of Corrosion and Protection of Metals; Academia Sinica; Shenyang; China) Rahmel; A.; Schorr; M.(DECHEMA Institut; Frankfurt/Main; West Germany)

全文: PDF(3735 KB)

摘要: 研究了在1173K温度的90Na_2SO_4-10K_2SO_4熔融盐中,单渗铝涂层和铂改性的渗铝涂层LDC-2的腐蚀行为和它们的电位关系。两种涂层都有一钝化电位区,在此电位区内,涂层表面可能生成保护性氧化膜,但单渗铝涂层的腐蚀速度高于LDC-2涂层。后者的钝化电位区较前者宽300mV。这两种涂层的酸性熔融腐蚀临界电位值十分接近。但碱性熔融临界电位差达约400mV,LDC-2涂层耐碱性熔融性能远优于单渗铝涂层。对于铂改进渗铝涂层抗碱性熔融腐性蚀能的机构,也进行了探讨。

Abstract：The corrosion behavior and the influence of the electrode potential on the corrosion behavior of simple Al-diffusion coating and Pt-containing Al-diffusion coating LDC-2 have been studied in a 90 mol.％ Na_2SO_4+10mol.% K_2SO_4 melt at 1173K.Both coatings exhibit a passive potential range, in which a protective oxide scale is formed on top of the coatings. The passive range of the Pt-containing coating LDC-2 is broader than that of the Pt-free coating, The Pt-free coating corrodes substantially faster in the passive range than the Pt-containing coating.The breakthrough potentials for acidic fluxing are close to each other for both coatings, but the LDC-2 type coating has significant higher resistance to basic fluxing than the Pt-free coating. The difference in basic breakthrough potentials of the coatings is approx. 400mV.The beneficial influence of Pt on the behavior of the Al-diffusion coating has also been discussed.

收稿日期: 1984-08-25

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引用本文:

吴维(山文);A.Rahmel;M.Schorr. 两种渗铝涂层在高温熔融碱金属硫酸盐中的腐蚀[J]. 中国腐蚀与防护学报, 1984, 4(4): 251-262.
. CORROSION BEHAVIOR OF Al-DIFFUSION COATINGS ON IN738LC IN ALKALI MELTS AT 1173K. J Chin Soc Corr Pro, 1984, 4(4): 251-262.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1984/V4/I4/251

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[2] Rahmel, A., Schorr, M., Schid/t, M., Oxid. Met., in press
[3] Wu Woitao; Rahmel, A., Schorr, M., Oxido Met., in prcss
[4] ErdOs, E.; Altofer, H., Denzler, E., WuK, 33, 373(1982)
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[8] Gupta, D. K., Rapp, R. A., J, Elecfrochem. Soc., 127, 2149(1980)

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