椭圆偏振法研究双层薄膜的形成

中国腐蚀与防护学报

1987, Vol. 7

Issue (4): 239-248

研究报告

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椭圆偏振法研究双层薄膜的形成

周庆初;徐乃欣;石声泰

中国科学院;上海冶金研究所

AN ELLIPSOMETRIC STUDY OF THE FORMATION OF TWO-LAYER THIN FILM

Zhou Qingchu Xu Naixin Shih Shengtai (Shanghai Institute of Metallurgy; Academia Sinica)

全文: PDF(708 KB)

摘要: 根据双层均质薄膜的两种不同生长模型,编写了处理双层膜的椭圆偏振参数的计算程序。用此计算程序对实验测出的椭偏数据△、ψ进行拟合计算,不但可以得到双层膜厚度和光学常数,而且还可以推测出双层膜的生长机制。文中列举了用该程序进行拟合计算的实例,分析了△、ψ的随机误差对拟合计算结果的影响,并对该程序的可靠性进行了验证。

Abstract：Layer structure and thickness of two-layer homogeneous thin film can be investigated by ellipsometric measurements starting from the film-free surface. A break observed on the experimental δΔ-δφ loci seems to suggest the presence of two layers on the substrate. The Drude equation modified for the two-layer film was presented. To determine the film growth and optical constants of the individual layers, the best fit approach was used between calculated Δ_c, φ_c for the proposed complex refractive indexes and the experimental ellipsometric data. Obviously, the second layer may be for reed either as inner layer or as outer layer related to the initially formed layer. These two possible mechanisms of film formation can be judged with ellipsometric computation. Examples of computation were given of passive films on cobalt as well as on stainless steel.

收稿日期: 1987-08-25

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引用本文:

周庆初;徐乃欣;石声泰. 椭圆偏振法研究双层薄膜的形成[J]. 中国腐蚀与防护学报, 1987, 7(4): 239-248.
. AN ELLIPSOMETRIC STUDY OF THE FORMATION OF TWO-LAYER THIN FILM. J Chin Soc Corr Pro, 1987, 7(4): 239-248.

链接本文:

https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1987/V7/I4/239

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