3%NaCl溶液中铜的表面膜及BTA膜的光电化学研究

中国腐蚀与防护学报

1995, Vol. 15

Issue (3): 237-239

研究报告

本期目录 | 过刊浏览

3%NaCl溶液中铜的表面膜及BTA膜的光电化学研究

任聚杰;杨迈之;童汝亭;蔡生民

河北医学院;北京大学;河北师范大学

PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA

Ren Jujie;Yang Maizhi;Tong Ruting;Cai Shengmin(Hebei Medical College)(Beijing University)(Hebei Normal University)

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摘要: ３％ＮａＣｌ溶液中铜的表面膜及ＢＴＡ膜的光电化学研究任聚杰，杨迈之，童汝亭，蔡生民（河北医学院石家庄０５００１７）（北京大学北京１００８７１）（河北师范大学石家庄０５００１６）１引言人们已经注意到Ｃｌ－对Ｃｕ有腐蚀作用［１，２］，关于ＢＴＡ对Ｃｕ的缓蚀作用亦有过一些研究［３－６］，但并未论及ＢＴＡ与Ｃｕ表面的结合情况，且用光电化学方法研究Ｃｌ－存在下ＢＴＡ对Ｃｕ缓蚀的文章尚未见到。本工作采用?...

Abstract：The corrosion behavior of copper and the inhibition of BTA for copper in 3% NaCl solution have been investigated by photo-electrochemical and XPS met hods. The results show that the surface film of copper in the solution is composed of Cu(I),O2-and Cl-However,CuCl has not been found as the primary component in the surfaCe film.The inhibition of BTA could be attributed to the formation of a protective and adsorptive film on Cu2O.The adsorption of BTA does not change the semiconductive properties of Cu2O on copper.

收稿日期: 1995-06-25

基金资助:国家教委优秀年轻教师基金

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引用本文:

任聚杰;杨迈之;童汝亭;蔡生民. 3%NaCl溶液中铜的表面膜及BTA膜的光电化学研究[J]. 中国腐蚀与防护学报, 1995, 15(3): 237-239.
. PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA. J Chin Soc Corr Pro, 1995, 15(3): 237-239.

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https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1995/V15/I3/237

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