磁过滤电弧离子镀制备TiAlN涂层的结构与性能表征
陈磊,裴志亮(
),肖金泉,宫骏,孙超
),肖金泉,宫骏,孙超
Characterization of Structure and Property of TiAlN Coatings Deposited by Filtered Arc Ion Plating
Lei CHEN,Zhiliang PEI(),Jinquan XIAO,Jun GONG,Chao SUN
),Jinquan XIAO,Jun GONG,Chao SUN
图3. 在0.2,0.4,0.6和0.8 Pa N2分压下沉积的TiAlN涂层的Rockwell-C压痕实验结果
Fig.3. Indentations of TiAlN coatings deposited at 0.2 Pa (a), 0.4 Pa (b), 0.6 Pa (c) and 0.8 Pa (d) N2 partial pressures after Rockwell-C test
