Effect of Magnetron Sputtering Process Parameters on CrN Films on 304 Stainless Steel and TheirCorrosion Behavior

doi:10.11902/1005.4537.2019.156

Journal of Chinese Society for Corrosion and protection

2019, Vol. 39

Issue (5): 423-430 DOI: 10.11902/1005.4537.2019.156

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Effect of Magnetron Sputtering Process Parameters on CrN Films on 304 Stainless Steel and TheirCorrosion Behavior

LUO Hong,GAO Shujun,XIAO Kui,DONG Chaofang(

),LI Xiaogang

National Materials Corrosion and Protection Science Data Center, Institute for Advanced Materials and Technology, University of Science and Technology Beijing, 100083 Beijing, China

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Abstract

CrN films on 304 stainless steel were prepared by magnetron sputtering. The effect of N₂ partial pressure, sputtering power and inclusion quantity of the steel on the structure, composition and corrosion resistance of the prepared films was investigated by means of X-ray diffraction (XRD) and scanning electron microscopy (SEM). The results show that the increase of nitrogen partial pressure is beneficial to the increment of CrN-phase content for the CrN film, while which presents obviously the preferential orientations of the crystal planes (111) and (200) of CrN-phase. Reducing the sputtering power is beneficial to generate the increased amount of Cr to participate in the reaction with nitrogen and thus generate more CrN. The amount of inclusions on the steel surface has significant influence on the quality of films, and the inclusions sites are not conducive to the integrity of the prepared CrN films, which, correspondingly, results in significant degradation of corrosion resistance for the prepared CrN films.

Key words: 304 stainless steel magnetron sputtering plating corrosion

Received: 13 September 2019

ZTFLH:

TG172

Fund: National Key Research and Development Program of China(2017YFB0702300);National Material Environment Corrosion Platform(2005DKA10400);National Natural Science Foundation of China(51671029)

Corresponding Authors: Chaofang DONG E-mail: cfdong@ustb.edu.cn

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Cite this article:

LUO Hong,GAO Shujun,XIAO Kui,DONG Chaofang,LI Xiaogang. Effect of Magnetron Sputtering Process Parameters on CrN Films on 304 Stainless Steel and TheirCorrosion Behavior. Journal of Chinese Society for Corrosion and protection, 2019, 39(5): 423-430.

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https://www.jcscp.org/EN/10.11902/1005.4537.2019.156 OR https://www.jcscp.org/EN/Y2019/V39/I5/423

Fig.1 XRD spectra of CrN films under different nitrogen partial pressures

Table 1 Partially similar peak position of CrN, Cr and 304 stainless steel substrates

Fig.2 Peak separation results of XRD under different nitrogen partial pressures: (a, c) 60%N₂, (b, d) 80%N₂

Fig.3 SEM images (a, c) and EDS results (b, d) of CrN under 60% (a, b) and 80% (c, d) nitrogen partial pressures

Fig.4 Cr-N binary phase diagram^[12]

Fig.5 XRD results of CrN films under different power levels

Fig.6 Peak separation results of XRD under different power levels: (a, c) 400 W, (b, d) 200 W

Fig.7 SEM image (a) and EDS results (b) of CrN under power level of 200 W

Fig.8 Morphology (a) and composition (b) of inclusions in 304 stainless steel

Fig.9 Morphology of inclusions after sputtering (a), the magnified image of circle area in Fig.9a (b), element mapping images of Cr (c) and N (d)

Fig.10 Surface morphologies of 304 stainless steel with 0.0429% (a), 0.0326 (b), 0.0198% (c) inclusion contents and their polarization curves in 3.5%NaCl solution after sputtering (d)

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