Please wait a minute...
中国腐蚀与防护学报  2013, Vol. 33 Issue (6): 491-495    
  研究论文 本期目录 | 过刊浏览 |
光电化学法研究316L不锈钢在高温水中生成氧化膜的半导体性质
檀 玉 梁可心 张胜寒
华北电力大学环境科学与工程学院 保定 071003
Photo-electrochemical Study on Semiconductor Properties of Oxide Films Formed on 316L Stainless Steel in High Temperature Water
TAN Yu, LIANG Kexin, ZHANG Shenghan
School of Environment Science and Engineering, North China Electric Power University, Baoding 071000, China
全文: PDF(733 KB)  
摘要: 采用光电化学响应法研究了316LSS在288 ℃高温水中形成的氧化膜的半导体性质,获得3个主要响应:带隙宽度2.3 eV认为是Fe氧化物Fe2O3和/或Ni的氢氧化物Ni(OH)2的特征带隙宽度;2.9和3.5 eV认为是Cr氧化物Cr2O3的特征带隙宽度;4.1~4.4 eV认为是FexNi1-xCr2O4的特征带隙宽度。通过光电流响应与施加偏压的实验可知,316LSS在此高温水中生成的氧化膜表现为n型半导体性质。
关键词 光电化学响应316L不锈钢氧化膜半导体性质高温水    
Abstract:The semiconductor property of oxide films formed on 316L stainless steel in high temperature water was investigated by photoelectrochemical responses technique. The photocurrent spectra of the oxide film formed on 316LSS in water at 288 ℃ showed three major characteristics: a band gap energy of 2.3 eV was attributed to the presence of Fe2O3, and/or Ni(OH)2; a band gap energy of 2.9 and 3.5 eV was attributed to Cr2O3 and a band gap energy in the range of 4.1 ~ 4.4 eV was attributed to the spinel phase Fe1-xNixCr2O4. Considering the relation of the photocurrent to the applied potential, it follows that the oxide film on 316L in high temperature water indicated an n-type semiconductor. Therefore, the photoelectrochemical responses technique, with full information about the photocurrent and the dephasing angles of the oxide films,represents a sensitive and powerful way to locally analyze the various oxide phases in the oxide scale.
Key wordsphotoelectrochemistry response    316L stainless steel    oxide film    semiconductor
property
   high temperature water
收稿日期: 2013-01-28     
ZTFLH:  O646  
基金资助:中央高校基本科研业务费专项资金 (13MS80) 资助
通讯作者: 檀玉,E-mail:lucifertan@163.com   
作者简介: 檀玉,男,1981年生,博士,研究方向为金属的腐蚀与防护

引用本文:

檀玉, 梁可心, 张胜寒. 光电化学法研究316L不锈钢在高温水中生成氧化膜的半导体性质[J]. 中国腐蚀与防护学报, 2013, 33(6): 491-495.
TAN Yu, LIANG Kexin, ZHANG Shenghan. Photo-electrochemical Study on Semiconductor Properties of Oxide Films Formed on 316L Stainless Steel in High Temperature Water. Journal of Chinese Society for Corrosion and protection, 2013, 33(6): 491-495.

链接本文:

https://www.jcscp.org/CN/      或      https://www.jcscp.org/CN/Y2013/V33/I6/491

[1] Olsson C-O A, Landolt D. Passive films on stainless steels-chemistry, structure and growth [J]. Electrochim. Acta, 2003, 48(9): 1093-1104
[2] Olefjord I, Wegrelius L. The influence of nitrogen on the passivation of stainless steels [J]. Corros. Sci., 1996, 38(7): 1203-1220
[3] MacDonald D D, Urquidi-Macdonald M. Theory of steady-state passive films [J]. J. Electrochem. Soc., 1990, 137(8): 2395-2402
[4] Xu J, Wu X Q, Han E-H. The evolution of electrochemical behaviour and oxide film properties of 304 stainless steel in high temperature aqueous environment [J]. Electrochim. Acta, 2012, 71(1): 219-226
[5] da Cunha Belo M, Walls M, Hakiki N E, et al. Composition,structure and properties of the oxide films formed on the stainless steel 316L in a primary type PWR environment [J]. Corros. Sci., 1998, 40(2/3): 447-463
[6] Mischler S, Vogel A, Mathieu H, et al. The chemical composition of the passive film on Fe-24Cr and F-24Cr-11Mo studied by AES, XPS and SIMS [J]. Corros. Sci., 1991, 32(9): 925-944
[7] Joon S K, Eun A C, Hyuk S K. Photoelectrochemical study on the passive film on Fe [J]. Corros. Sci., 2001, 43(8): 1403-1415
[8] Hee J J, Chan J P, Hyuk S K. Photoelectrochemical analysis on the passive film formed on Ni in pH 8.5 buffer solution [J]. Electrochim. Acta. 2005, 50(16/17): 3503-3508
[9] Tsuchiya H, Fujimoto S, Chihara O, et al. Semiconductive behavior of passive films formed on pure Cr and Fe-Cr alloys in sulfuric acid solution [J]. Electrochim. Acta. 2002, 47(27): 4357-4366
[10] Quarto F D, Piazza S, Sunseri C, et al. Photoelectrochemical characterization of thin anodic oxide films on zirconium metal [J]. Electrochim. Acta, 1996, 41(16): 2511-2521
[11] Carmezim M J, Sim?es A M, Montemor M F, et al. Capacitance behavior of passive films on ferritic and austenitic stainless steel [J]. Corros. Sci., 2005, 47(3): 581-591
[12] Fujimoto S, Chihara O, Shibata T. Photo electrochemical response of passive films formed on pure Cr and Fe-Cr alloys in sulphuric acid solution [J]. Mater. Sci. Forum, 1998, 289-292: 989-996
[13] Tan Y, Liang K X, Zhang S H. Semiconductor properties of the passive film formed on Ni201 in neutral solution [J]. Acta Metall. Sin., 2012, 48(8): 971-976
(檀玉, 梁可心, 张胜寒. 光电化学响应分析Ni201在中性溶液中形成表面钝化膜的半导体性质 [J]. 金属学报, 2012, 48(8): 971-976)
[14] Wouters Y, Bamba G, Galerie A, et al. Oxygen and water vapour oxidation of 15Cr ferritic stainless steels with different silicon contents [J]. Mater. Sci. Forum, 2004, 461-464: 839-848
[15] Quarto F D, Piazza S, Sunseri C. Photoelectrochemistry in corrosion studies: achievements and perspectives [J]. Mater. Sci. Forum, 1995, 192-194: 633-648
[16] Piazza S, Sperandeo M, Sunseri C, et al. Photoelectrochemical investigation of passive layers formed on Fe in different electrolytic solutions [J]. Corros. Sci., 2004, 46(4): 831-851
[17] Antonov V N, Harmon B N, Yaresko A N. Electronic structure and X-ray magnetic circular dichroism in Fe3O4 and Mn-, Co-, or Ni-substituted Fe3O4 [J]. Phys. Rev., 2003, 67(2)B: 024417-024430
[18] Quarrto F D, Romano M C, Santamaria M, et al. A semiempirical correlation between the optical band gap of hydroxides and the electronegativity of their constituents [J]. Russ. J. Electrochem., 2000, 36(1): 1203-1208
[19] Sunseri O, Piazza S, Quarto F D. Photocurrent spectroscopic investigations of passive films on chromium [J]. J. Electrochem. Soc., 1990, 137(8): 2411-2417
[20] Carpenter M K, Corrigan D A. Photoelectrochemistry of nickel hydroxide thin films electrochemical science and technology [J]. J. Eletrochem. Soc., 1989, 136(4): 1022-1026
[21] Kofstad P, Lillerud K P. On high temperature oxidation of chromium: II Properties of Cr2O3 and the oxidation mechanism of chromium [J]. J. Electrochem. Soc., 1980, 127(11): 2410-2419
[22] Young E W A, Gerretsen J H, Witt J H W. The oxygen partial pressure dependence of the defect structure of chromium (III) oxide [J]. J. Electrochem. Soc., 1987, 134(9): 2257-2260
[23] Henry S, Mougin J, Wouters Y, et al. Characterization of chromia scales grown on pure chromium in different oxidizing atmospheres [J]. Mater. High Temp., 2000, 17(2): 231-235
[24] Marchetti L, Perrin S, Wouters Y, et al. Photoelectrochemical study of nickel base alloys oxide films formed at high temperature and high pressure water [J]. Electrochim. Acta, 2010, 55(19): 5384-5392
[1] 张震, 吴欣强, 谭季波. 电化学噪声原位监测应力腐蚀开裂的研究现状与进展[J]. 中国腐蚀与防护学报, 2020, 40(3): 223-229.
[2] 胡玉婷, 董鹏飞, 蒋立, 肖葵, 董超芳, 吴俊升, 李晓刚. 海洋大气环境下TC4钛合金与316L不锈钢铆接件腐蚀行为研究[J]. 中国腐蚀与防护学报, 2020, 40(2): 167-174.
[3] 秦越强, 左勇, 申淼. FLiNaK-CrF3/CrF2氧化还原缓冲熔盐体系对316L不锈钢耐蚀性能的影响[J]. 中国腐蚀与防护学报, 2020, 40(2): 182-190.
[4] 魏欣欣,张波,马秀良. FeCr15Ni15单晶600 ℃下热生长氧化膜的TEM观察[J]. 中国腐蚀与防护学报, 2019, 39(5): 417-422.
[5] 肖金涛,陈妍,邢明秀,鞠鹏飞,孟引根,王芳. 工艺参数对2195铝锂合金阳极氧化膜的耐蚀性影响[J]. 中国腐蚀与防护学报, 2019, 39(5): 431-438.
[6] 郝利新, 贾瑞灵, 张慧霞, 张伟, 赵婷, 翟熙伟. 7A52铝合金双丝MIG焊接头的不均匀性对其表面微弧氧化膜腐蚀防护作用的影响[J]. 中国腐蚀与防护学报, 2018, 38(3): 219-225.
[7] 周霄骋, 崔巧棋, 贾静焕, 刘智勇, 杜翠薇. Cl-浓度对316L不锈钢在碱性NaCl/Na2S溶液中SCC行为的影响[J]. 中国腐蚀与防护学报, 2017, 37(6): 526-532.
[8] 杜开发,王彬,甘复兴,汪的华. 铜锡合金阳极在熔融碳酸盐中氧化膜的形成及其防护性能[J]. 中国腐蚀与防护学报, 2017, 37(5): 421-427.
[9] 冯立, 张立功, 李思振, 郑大江, 林昌健, 董士刚. 柠檬酸铁浓度对镁合金微弧氧化黑色膜层微观结构及耐蚀性的影响[J]. 中国腐蚀与防护学报, 2017, 37(4): 360-365.
[10] 周和荣,胡碧华,姚望,洪新培,宋述鹏. 铝合金阳极氧化层在江津污染大气环境中暴露腐蚀行为研究[J]. 中国腐蚀与防护学报, 2017, 37(3): 273-278.
[11] 王彦亮,陈旭,王际东,宋博,范东升,何川. 316L不锈钢在不同pH值硼酸溶液中的电化学行为研究[J]. 中国腐蚀与防护学报, 2017, 37(2): 162-167.
[12] 王胜刚, 孙淼, 龙康. 紫外光电子能谱和X射线光电子能谱表征在金属材料腐蚀中的应用[J]. 中国腐蚀与防护学报, 2016, 36(4): 287-294.
[13] 刘静,李晓禄,朱崇伟,张涛,曾冠鑫,孟国哲,邵亚薇. 利用人工神经网络技术预测气田环境下316L不锈钢临界点蚀温度[J]. 中国腐蚀与防护学报, 2016, 36(3): 205-211.
[14] 丁祥彬,孙华,俞国军,周兴泰. Hastelloy N合金和316L不锈钢在LiF-NaF-KF熔盐中的腐蚀行为研究[J]. 中国腐蚀与防护学报, 2015, 35(6): 543-548.
[15] 张志明,彭青娇,王俭秋,韩恩厚,柯伟. 核用锻造态316L不锈钢在330 ℃碱溶液中应力腐蚀开裂行为研究[J]. 中国腐蚀与防护学报, 2015, 35(3): 205-212.