铝合金孔底电位的研究

中国腐蚀与防护学报

1991, Vol. 11

Issue (4): 387-392

研究报告

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铝合金孔底电位的研究

仝奎;火时中

郑州冶金部金属制品研究院;大连理工大学

A STUDY OF POTENTIAL AT PIT BOTTOM ON ALUMINIUM ALLOY IN 3.％NaCl SOLUTION

Tong Kui and Huo Shizhong (Dalian University of Technology)

全文: PDF(365 KB)

摘要: <正> 一、引言铝合金是广为应用的结构材料之一,但常因发生小孔腐蚀而影响其使用寿命。因此研究铝合金孔蚀的再钝化过程既有理论意义,又有实用价值。孔底电位是孔内其他电化学参数的综合反映,从测得的孔底电位,可分析蚀孔生长过程中孔内的状态及在再钝化过程中变化情况。及认为随着小孔变深,孔底与金属表面的欧姆电位降增大,孔底电位负移到钝化区从而发生再钝化。而Strehblow的观点暗示了在再钝化过程中孔底电位将从活化区正移到Flade电位以上的钝化区,即认为蚀孔内表面是处于活性溶解区。Okada

Abstract：A systematic investigation was made on the change of potential at pit bottom on aluminium alloy 3003 in neutral chloride solution (3.5%NaCl) with potentiodynamic, galvanodynamic, potentiostatic and galvanostatic measurements. The potential at pit bottom of this metal in the solution is more positive than that on surface. The larger the dissolution current, the more positive the potential at pit bottom is than that on surface. The pit bottom potential is gradually getting negative at constant current.

收稿日期: 1991-08-25

基金资助:国家自然科学基金

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引用本文:

仝奎;火时中. 铝合金孔底电位的研究[J]. 中国腐蚀与防护学报, 1991, 11(4): 387-392.
. A STUDY OF POTENTIAL AT PIT BOTTOM ON ALUMINIUM ALLOY IN 3.％NaCl SOLUTION. J Chin Soc Corr Pro, 1991, 11(4): 387-392.

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https://www.jcscp.org/CN/ 或 https://www.jcscp.org/CN/Y1991/V11/I4/387

[1] #12
[2] #12
[3] #12
[4] Rosenfeld, N. L., etal., J. Electrochem. Soc., 125, 1729(1978)
[5] Strehblow, H. H., Werks. u. Korr., 27, 792(1976)
[6] Strehblow, H. H., 9th ICMC, Toronto Canada, 2,99(1984)
[7] Okada, T. et al., Corros. Sci., 17, 671(1977)
[8] Szkldarska-Smialowska, Z. and Mankowski, J., Corros. Sci., 12, 925(1972)
[9] Hisamatus, Y. et al., Localized Corrosion, NACE, 261, 1974
[10] Beck, T. R., Electrochimica Acta, 29, 485(1984)

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